Inpria and Amorphyx gather honors at Semicon

August 4th, 2014

ONAMI gap fund portfolio companies Inpria and Amorphyx won significant recognition at the Silicon Innovation Forum at Semicon West, as both corporate and VC investors discussed strategies for early stage investments in semiconductor technology and adjacent fields. Inpria was highlighted by Intel Capital, Samsung Ventures and Applied Materials Ventures. As reported by Solid State Technology, “the strategic investors from the venture arms of Samsung, Intel and Applied Materials all cited innovative materials solutions as the investments about which they were currently most excited, particularly Inpria for its high-resolution metal oxide photoresists.” Joint investments in strategic platform technologies by teams of major companies in the industry are becoming more common. Inpria has also received investment from the Oregon Angel Fund.

In the same Silicon Innovation Forum, approximately 30 early stage companies pitched to a panel of VC partners. OANMI gap fund portfolio company was one of two to receive a Best Pitch award from the panel. Reports SST, Amorphyx offers a “fast switching, low cost backplane solution for displays, using a kind of tunneling effect through a near-perfect amorphous sapphire insulating layer in a metal-insulator-metal device. The company is working at ITRI in Taiwan. With a production collaborative it put together three Asian companies, aiming to start joint production in 2015. ‘This should save $100 of the cost of a $400 display,’ claimed CEO and President John Brewer.”

More detail may be found at http://electroiq.com/blog/2014/07/vcs-still-investing-in-semiconductor-technology-but-need-strategic-partners-in-capital-and-efficiency/.