Inpria takes off
November 15th, 2016
Inpria’s novel class of photoresist materials—metal oxide photoresists—addresses emerging needs in the electronics industry, and the community has taken notice.
- Last month the American Chemical Society named Inpria one of the "Top 10 Startups to Watch": http://cen.acs.org/articles/94/i43/Inpria.html
- Inpria’s novel technology exploits a five-fold increase in the resist sensitivity of EUV lithography and in its capacity to create patterns without amplification. IEEE Spectrum recently published a detailed overview on EUV lithography including Inpria’s role in the field: http://spectrum.ieee.org/semiconductors/devices/leading-chipmakers-eye-euv-lithography-to-save-moores-law
- At ASML’s SmallTalk2016 Investor Day, October 31, the company outlined its strategic outlook. Download a .pdf of Hans Meiling's presentation, Role of EUV and its Business Opportunity here; the comparative sensitivity of the state-of-the-art versus Inpria’s technology is depicted on Slide 21. All the event presentations are available at: https://www.asml.com/asml/show.do?ctx=51001&rid=51002.
When: Inpria was founded in 2007 and was one of the first startups funded by ONAMI’s Commercialization Program.
Where: Inpria has labs on the Oregon State University campus and at the Advanced Technology and Manufacturing Institute located on the Hewlett-Packard Corvallis Campus. ATAMI is an OSU research and commercialization center whose focus is on advanced materials, processes and manufacturing and on very-large-scale Internet of Things. ATAMI is also one of seven ONAMI Tech Labs.
Visit Inpria's website at: http://www.inpria.com/